Samsung patents iPhone X like notch design for its upcoming phones

Apple’s iPhone X is proving to be an inspiration for many brands. Two of the Android-powered smartphones have surfaced so far which are a clone of famed iPhone X. iPhone X has managed to give a bezel-less design by hiding front-facing cameras, sensors, and speakers under the screen, with an ugly looking top notch. As far as the rumors go, the same notch will be found on all upcoming iPhones going forward. As of now, the South Korean giant, Samsung has filed a new patent which follows design pattern somewhat similar to iPhone X.

No, at least not for this time, we will not relate this patent with Galaxy S9, as the device is set to launch next month at MWC, but this upcoming smartphone (possibly Note 9) will be unveiled somewhere near November or earlier next year. According to the new patent, first reported by MobielKopin, Samsung is working on several smartphone designs with bezel-less screens, front-facing cameras, and sensors, all hidden by a quite similar yet different notch to iPhone X.

One of the patents filed by the company reveals an Essential Phone like approach, where the notch doesn’t occupy much space yet does the job. Samsung doesn’t seem to consider bigger notches mainly because of the two reasons. Number one is that Samsung is not availing 3D depth-sensing technology for Face ID anytime soon which makes the notch look bigger. Secondly, Samsung necessarily doesn’t want to waste its reputation by copying its closest rival’s design exactly in the same manner.

The other patent shows a quiet elegant yet far from reach approach, similar to Xiaomi Mi Mix 2, though the camera is placed at the top, instead of awkwardly placing it on the bottom.

The sketch of the patents also reveals that fingerprint sensor is placed under the screen rather than placing it on the back. While another good news for old school boys is that Samsung is not planning to ditch its 3.5mm headphone jack anytime soon.